Our instrument detects total pressure and a residual gas in a pure gas background down to part-per-billion levels. Thanks to our innovative microtechnology based on physical detection in the corrosion-resistant nitride semiconductor platform, our compact solution delivers an online point-of-process measurement over a wide range of process pressures, from hundreds of atmospheres to high vacuum, without the need for differential pumping. Our design features all-metal vacuum seals, an ISO-KF vacuum flange, and SEMI-standard EtherCAT communication.